Recombination
binary_zb {
name = Si
# material name, e.g. Si,
GaAs, InP, ...
...
recombination{
# Shockley-Read-Hall recombination
SRH{
tau_n = 1.0e-9 # [s]-3
zero doping scattering time for electrons
nref_n = 1.0e19 # [cm-3]
reference doping concentration for electrons
tau_p = 1.0e-9 # [s]-3
zero doping scattering time for holes
nref_p = 1.0e18 # [cm-3]
reference doping concentration for holes
}
The generation/recombination process can be assisted by
impurities.
This is modeled by the Shockley-Read-Hall model (SRH).
The recombination/generation rates depend on the
deviation of the carrier concentration from the equilibrium value
and the scattering rates depend on the doping
concentration.
RSRH = ( n p - ni2
) / ( ( taup ( n + ni ) + (taun ( p + ni
))
taun(ND+NA) = tau_n
/ ( 1 + [ ( ND+NA ) / nref_n ] )
taup(ND+NA) = tau_p
/ ( 1 + [ ( ND+NA ) / nref_p ] )
# Auger recombination
Auger{ c_n
= 2.8e-31 # [cm6/s]
c_p = 9.9e-31 # [cm6/s]
}
More information on the Physics:
Auger recombination processes in semiconductor heterostructures
For devices with an extremely
high carrier concentration the Auger process is the dominant recombination
channel.
The process involves three particles and therefore scales with the
third power of the carrier densities.
The phonon-assisted Auger recombination rate, which plays an important role
especially at high carrier injection,
respectively high doping levels, will be modeled in
the program by the following equation:
RAuger = ( c_n
n + c_p p ) ( np
- ni2 )
# direct recombination
radiative{ c = =
2.0e-10 } # [cm3/s]
# 2.0e-10 for GaAs,
0 for Si (indirect semiconductor)
The simplest process for the generation and recombination of
electron-hole pairs is the direct process
via the emission or absorption of a photon (radiative
recombination). This is important for light emitting devices.
Rradiative = c ( n p -
ni2 )
}
}
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